Call for Application - Higher Institute of Fine Arts (HISK) - Ghent

CALL FOR APPLICATION - HIGHER INSTITUTE OF FINE ARTS (HISK) - GHENT
Deadline: June 15, 2009

Artists who have already obtained a Masters degree in Fine Art or an equivalent qualification are eligible to apply to the HISK. Exceptions can be made for applicants who do not have a Post Graduate degree in Fine Art but display a high level of development, motivation and artistic affinity. This is decided on the basis of an interview in which an applicant's experience, professional or otherwise, is discussed.

A diverse group of artists who are able to work together as a community are chosen each year. All young practitioners selected for the program are believed to share a common potential for growth.

The admission committee is composed of international visiting lecturers from a variety of backgrounds. They make a pre-selection from the submitted portfolios and the candidates who make it through are invited for an interview regarding their motivations and expectations. After a period of evaluation and careful consideration, the committee then makes a decision as to whether the applicant is suitable.

The conceptual and visual qualities in the works submitted by applicants are considered to be more important than style, material or technique. Participants are expected to have a strong commitment to conducting critical research within their respective fields of interest. At the same time, they should aim towards locating their practice within a broader perspective of social and cultural environments. Candidates are also expected to make a contribution to the activities of the HISK as a whole. This interaction is seen to be an important forum of exchange and development.
Basic criteria for assessment are:
- The quality of the submitted work
- Evidence of a potential to explore various aesthetic possibilities
- The degree to which the work distinguishes itself from overt influences
- The coherence of the body of work
- The social/political relevance of the work
- The quality of presentation in the submitted portfolio (both text and images)
- Motivation for choosing the HISK
- Willingness to be involved in the HISK programme and ability to set aside time for this
- Ability to speak and be critical about your work
- The potential to grow within the HISK programme, both on an artistic and a personal level
- Evidence of sufficient maturity to be able to work independently

Each year between 12 and 14 candidate laureates are admitted.

More information:
www.hisk.edu